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论文编号：	14611
作者编号：	2120213457
上传时间：	2024/6/4 17:04:48
中文题目：	面向技术预见的氮化硅专利分析研究
英文题目：	Technology Foresight Oriented Silicon Nitride Patent Analysis
指导老师：	李颖
中文关键字：	氮化硅；专利分析；技术预见
英文关键字：	Silicon nitride; Patent analysis; Technological foresight
中文摘要：	随着新材料科学和技术的快速发展，氮化硅因其优异的高温稳定性、高强度、耐磨损和抗腐蚀等特性，在多个高科技领域展现出巨大的应用潜力。专利作为技术信息最有效、最全面的载体，所蕴含的技术内容十分丰富，通过分析大量的专利数据，可以很好的把握技术动态。本文旨在全面系统地梳理全球氮化硅领域的专利概况，揭示其技术发展态势和未来发展方向，在一定程度上实现该领域技术预见，从而为氮化硅技术领域的研发提供指导，为相关产业的战略布局和政策制定提供科学依据。 本文通过智慧芽（Patsnap）全球专利数据库进行检索，获取全球氮化硅技术领域的专利数据并进行数据清洗和标引，采用专利地图方法从专利申请趋势、技术流向、技术分布、主要创新主体等方面对其进行了多维度分析，得出氮化硅整体技术发展态势。另外，本文聚焦于四个重点技术分支深入研究，分别为致密氮化硅、氮化硅薄膜、多孔氮化硅和氮化硅纤维及纳米材料，从专利申请趋势、技术流向、技术分布、技术功效矩阵、技术演进、专利转移和主要创新主体方面分别对其进行分析，得出氮化硅重点技术发展态势，并预测其未来发展趋势和技术创新聚焦点。 首先，氮化硅技术领域未来均会在制备技术和工艺创新、多元化应用领域拓展两方面继续发展。其次，致密氮化硅领域还会侧重烧结助剂的精细化选择，并将聚焦于新型成型和先进烧结技术、对材料微观结构的精确调控，以及表面处理技术；氮化硅薄膜领域侧重蚀刻技术精细化与选择性的增强，并聚焦于研发新型纳米结构功能薄膜、集成多功能于一体，以及开发绿色环保工艺；多孔氮化硅领域关注造孔方法的创新与优化，并聚焦于制备工艺的智能化与绿色化，材料性能的个性化定制以及材料微观结构的设计；氮化硅纤维及纳米材料领域则会侧重复合材料增强剂的工艺优化，并聚焦于环境友好型工艺、创新氮化硅纤维表面处理技术，以及降低成本。
英文摘要：	With the rapid development of new material science and technology, silicon nitride has shown great application potential in many high-tech fields because of its excellent high temperature stability, high strength, wear resistance and corrosion resistance. As the most effective and comprehensive carrier of technical information, patent contains very rich technical content. By analyzing a large number of patent data, we can grasp the technical trends well. This paper aims to comprehensively and systematically review the patents in the field of global silicon nitride, reveal its technological development trend and future development direction, and achieve technological foresight in this field to a certain extent, so as to provide guidance for the research and development of silicon nitride technology and provide scientific basis for the strategic layout and policy formulation of related industries. In this paper, the global patent data in the field of silicon nitride technology were obtained through Patsnap global patent database search, data cleaning and indexing were carried out, and multi-dimensional analysis was carried out from the aspects of patent application trend, technology flow direction, technology distribution and main innovation entities by using patent map method, and the overall development trend of silicon nitride technology was obtained. In addition, this paper focuses on the in-depth study of four key technology branches, namely dense silicon nitride, silicon nitride film, porous silicon nitride and silicon nitride fiber and nanomaterials, and analyzes them from the aspects of patent application trend, technology flow direction, technology distribution, technology efficiency matrix, technology evolution, patent transfer and main innovation subjects. The development trend of key technical branches of silicon nitride is obtained, and its future development trend and technological innovation focus are predicted. First of all, the field of silicon nitride technology will continue to develop in the future in both preparation technology and process innovation, and the expansion of more diversified application fields. Secondly, the field of dense silicon nitride will also focus on the fine selection of sintering additives, and will focus on new forming and advanced sintering technology, precise control of material microstructure, and surface treatment technology; The field of silicon nitride film focuses on the refinement and enhancement of selectivity of etching technology, and focuses on the development of new nanostructured functional films, integrated multi-function, and the development of green environmental protection processes; The field of porous silicon nitride focuses on the innovation and optimization of pore-making methods, and focuses on the intelligent and green preparation process, the personalized customization of material properties and the design of material microstructure; In the field of silicon nitride fibers and nanomaterials, the focus will be on process optimization of composite reinforcers, with a focus on environmentally friendly processes, innovative silicon nitride fiber surface treatment technologies, and cost reduction.
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